Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1992-11-19
1994-12-06
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, C23C 1434
Patent
active
053707788
ABSTRACT:
A method is provided to form a basal oriented coating of molybdenum sulfide of the formula MoS.sub.2 on a substrate by employing the techniques of reactive sputtering comprising: (a)(i) sputtering lead (Pb) and molybdenum (Mo) from homogeneous targets of Pb and Mo in vacuo in an atmosphere of argon and hydrogen sulfide or (ii) sputtering Pb and MoS.sub.2 from homogeneous targets of Pb and MoS.sub.2 in an atmosphere of argon (no H.sub.2 S), so as to deposit a coating comprising of Pb, S and Mo on said substrate; and (b) annealing said coating at a pressure at which the Pb is lost from the coating; wherein the targets and the substrate are contained within a vacuum chamber during steps (a) and (b).
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Koo Kwan F.
Schrader Glenn L.
Iowa State University & Research Foundation, Inc.
Nguyen Nam
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