Method for preparing a source material including forming a...

Details Method for preparing a source material including forming a... Method for preparing a source material including forming a...

2004-08-17

2009-02-24

Lee, Hsien-ming (Department: 2823)

Semiconductor device manufacturing: process

Introduction of conductivity modifying dopant into...

C438S513000, C438S514000, C438S515000

Reexamination Certificate

active

07494905

ABSTRACT:
The present invention provides, for use in a semiconductor manufacturing process, a method (100) of preparing an ion-implantation source material. The method includes providing (110) a deliquescent ion implantation source material and mixing (110) the deliquescent ion implantation source material with an organic liquid to form a paste.

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