Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2007-10-02
2007-10-02
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C977S943000
Reexamination Certificate
active
10636843
ABSTRACT:
The present invention relates to a method for preparing a nanowire crossbar structure, comprising: (a) providing a substrate; (b) depositing thereon a composite structure comprising a nucleic acid-block copolymer having equidistant nucleic acid-catalyst binding sites and at least one catalyst nanoparticle functionalized to bind specifically to nucleic acid segments of the copolymer; (c) applying a directed gas flow and/or an alternating electric field onto the composite structure; and (d) applying chemical vapor deposition techniques, a use of such a structure and a structure obtainable by such a method.
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Yu Huang et al: “Directed Assembly of One-Dimensional Nanostructures Into Functional Networks”, Science, Jan. 26, 2001, American Assoc. Adv. Sci, USA, vol. 291, No. 5504, pp. 630-633, XP002226671.
Ford William E.
Wessels Jurina
Yasuda Akio
Olsen Allan
Sony Deutschland GmbH
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