Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-11-19
1992-12-08
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, 427130, 427166, G11B 1100, G11B 1304
Patent
active
051695049
ABSTRACT:
Method for preparing a magneto optic memory comprising on a support (22), such as one made of glass, metal or a plastic material, a planar sensitive film (21) of magneto optic material for receiving at each point the recording of one of the two binary digits 0 and 1 in the form of small domains juxtaposed and magnetized perpendicular to the plane of the film in one of the two possible directions with respect to the latter, the sensitive film (21) being deposited by a cathodic or other evporation process of a magentic oxide selected from the group including spinel ferrites, hexaferrites and ferrimagnetic garnets, the preceding deposition being followed by a crystallization of the amorphous regions of said film with the aid of an annealing, wherein at least one reflective film (28) and/or one film constituting a thermal screen is inserted between the support (22) and the sensitive film (21) and wherein the annealing is a fast annealing, namely of a few seconds at a temperature of between 600.degree. C. and 650.degree. C.
REFERENCES:
patent: 4608142 (1986-08-01), Gomi et al.
Bechevet Bernard
Challeton Didier
Rolland Bernard
Vallon Bruno
Commissariat a l''Energie Atomique
Weisstuch Aaron
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