Method for preparation of semiconductor structures and devices w

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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29576W, 29580, 29591, 156646, 156648, 156653, 156655, 156657, 1566591, 156662, 156668, 204192EC, 204192E, 357 49, 357 65, 427 93, 427 94, H01L 21306, B44C 122, C03C 1500, C03C 2506

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active

045991367

ABSTRACT:
A method of fabrication of semiconductor structures which utilize trenches filled with polymeric dielectric materials to isolate segments thereof is disclosed. Contamination of the polymeric dielectric during processing of structural segments is avoided by filling the trenches with disposable polymer through formation of conductive patterns upon the structure, with subsequent removal of the disposable polymer and replacement with the desired polymeric dielectric.

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patent: 4367119 (1983-01-01), Logan et al.
patent: 4502914 (1985-03-01), Trumpp et al.
patent: 4532696 (1985-08-01), Iwai

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