Method for polishing titanium carbide

Details Method for polishing titanium carbide Method for polishing titanium carbide

1983-03-10

1984-03-06

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156639, 156903, 252 791, B44C 122, C03C 1500, C03C 2506

Patent

active

044352476

ABSTRACT:
A method for the chemical-mechanical polishing of titanium carbide surfaces to a high degree of perfection is described. The titanium carbide surfaces are continuously wetted with a water slurry containing a soft abrasive material. The continuously wiping of the titanium carbide surface is accomplished with a firm surface using pressure while maintaining a relative movement between the titanium carbide surface and the firm surface to remove the water reacted titanium carbide product from the high points of the titanium carbide surface. This method is continued until a high degree of perfection of the surface is accomplished. The slurry is typically composed of colloidal silicon dioxide dispersed in water. The titanium carbide surface can also include an aluminum oxide component. Where aluminum oxide is present it is preferred to have about 60 to 80% aluminum oxide and 40 to 20% titanium carbide by weight in the surface structure.

REFERENCES:
patent: 3615955 (1971-10-01), Regh et al.
patent: 3869323 (1975-03-01), Basi
patent: 3869324 (1975-03-01), Basi et al.
patent: 4011099 (1977-03-01), Gutsche
patent: 4057939 (1977-11-01), Basi
patent: 4130847 (1978-12-01), Head
patent: 4251841 (1981-02-01), Jacobs
Technical Bulletin 1-237, Syton Colloidal Silica and its Applications, pp. 1-16, Monsanto Co.
Syloid 701 Silicon Wafer Polishing, Davison Chemical Division.
Quso, Micro Fine Precipitated Silicas, Philadelphia Quartz Co., pp. 1-8.
Bulletin K-5, Nalcoag Colloidal Silicas.
Specialty Chemicals, P Q Corporation.
Nalco, Nalcoag 1034 A, Nalco Product Bulletin K5-1034A.
Ludox Colloidal Silica, DuPoint, pp. 1-20.
Report on the Measurement of Surface Finish by Stylus Methods, Mar. 24, 1944, Reason et al., pp. 9-20.
Nalco, Technifax, Specialty Chemicals TF109, Physical and Chemical Properties of Nalcoag Silica Sols, 3-79. _
Nalco, Technifax, Specialty Chemicals TF110, Applications of Nalcoag Colloidal Silicas, 12-80.
Rodel, Wafer Polishing and Fixturing Products.
Rodal, Polishing Products.
Politex Polishing Poromerics, Geos.
Polishing Pads, Newman.
A. I. Avgustinik et al., in "Reaction of Titanium Carbide with Water" published in Porosh Met, 1967 (Russian).
"The Preparation of Sapphire Surfaces for Silicon Epitaxy" by T. A. Zeveke et al., published in Soviet Physics-Crystallography, vol. 13, No. 3, Nov.-Dec. 1968, pp. 493 through 495.
"Removal of the Microscopic Polishing Damage from Sapphire and Spinel" by M. Berkenblit et al., IBM Technical Disclosure Bulletin, vol. 13, No. 12, May 1971, pp. 3781 and 3782.
"The Chemical Polishing and Etch Pitting of Sapphire" by R. G. Vardiman, published in J. Elec. Chem. Soc., vol. 118, No. 11, pp. 1804-1809, Nov. 1971.
"Polishing of Sapphire and Colloidal Silica" by H. W. Gutsche et al., J. Elec. Soc. Solid State Science and Technology, vol. 125, No. 1, pp. 136-138, Jan. 1978.
"Pad Materials for Chemical-Mechanical Polishing" by Eric Mendel et al., in vol. 79-1, Extended Abstracts of Elec. Chem. Soc. Spring Meeting, Boston, Mass., May 6-11, 1979, Abs. No. 186, pp. 488-490.

Affiliated with

Also associated with

Rating

Method for polishing titanium carbide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for polishing titanium carbide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for polishing titanium carbide will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-740243