Method for polishing detector material

Details Method for polishing detector material Method for polishing detector material

1984-12-21

1986-07-15

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156639, 156645, 156651, 156903, 156345, 252 791, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

046004696

ABSTRACT:
A method for chemically-mechanically polishing detector material such as mercury cadmium telluride (HgCdTe) to obtain damage free surfaces. The polishing system includes a potassium-iodine iodide in a deionized water base, in combination with an inert lubricant, such as ethylene glycol, and a semisoft porous polishing pad made from, for example, an expanded polyurethane material.

REFERENCES:
patent: 4184908 (1980-01-01), Lackner et al.
patent: 4323422 (1982-04-01), Calawa et al.
patent: 4436580 (1984-03-01), Boyd et al.
patent: 4475981 (1984-10-01), Rea

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