Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized
Reissue Patent
2003-07-24
2009-11-10
Chen, Bret (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Electrostatic charge, field, or force utilized
C427S569000, C427S571000
Reissue Patent
active
RE040963
ABSTRACT:
A method for achieving a highly uniform plasma density on a substrate by shaping an induced electric field including the steps of positioning the substrate in a processing chamber, supplying a high frequency power to a spiral antenna generating an induced electric field in the processing chamber, generating a plasma in the processing chamber, and shaping the electric field with respect to the substrate to achieve a uniform distribution of plasma on the substrate being processed.
REFERENCES:
patent: 3886896 (1975-06-01), Van Cakenberghe
patent: 4292153 (1981-09-01), Kudo et al.
patent: 4434742 (1984-03-01), Henaff et al.
patent: 4539068 (1985-09-01), Takagi et al.
patent: 4948458 (1990-08-01), Ogle
patent: 4985109 (1991-01-01), Otsubo et al.
patent: 4989542 (1991-02-01), Kamo
patent: 5091049 (1992-02-01), Campbell et al.
patent: 5180435 (1993-01-01), Markunas et al.
patent: 5231334 (1993-07-01), Paranjpe
patent: 5277751 (1994-01-01), Ogle
patent: 5304279 (1994-04-01), Coultas et al.
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5433812 (1995-07-01), Cuomo et al.
patent: 5556501 (1996-09-01), Collins et al.
patent: 5560776 (1996-10-01), Sugai et al.
patent: 5629653 (1997-05-01), Stimson
patent: 5637961 (1997-06-01), Ishii et al.
patent: 5681393 (1997-10-01), Takagi
patent: 5685942 (1997-11-01), Ishii
patent: 5728253 (1998-03-01), Saito et al.
patent: 6080271 (2000-06-01), Fujii
patent: 0379828 (1990-08-01), None
patent: 4-290428 (1992-10-01), None
Takechi, Seiji, et al., “Electron Heating and Control of RF-Produced Plasma Parameters Excited by a Planar, Spiral Antenna”. Jpn. J. Appl. Phys. 36 (1997) pp. 4558-4562, Part 1, No. 7B, July 1977.
Hideo Sugai, Kenji Nakamura and Keiju Suzuki, Electrostatic Coupling of Antenna and the Shielding Effect in Inductive RF Plasmas, Apr. 1994, pp. 2189-2193, Jpn. J. Appl. Phys. vol. 33 (1994), Part 1, No. 4B.
Hata Jiro
Ishii Nobuo
Chen Bret
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
LandOfFree
Method for plasma processing by shaping an induced electric... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for plasma processing by shaping an induced electric..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for plasma processing by shaping an induced electric... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4075510