Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-08-18
1988-03-01
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419226, 427 39, 427255, C23C 1434
Patent
active
047284064
ABSTRACT:
A method for the plasma coating of a layer of material atop a semiconductor body, said method and apparatus adapted to substantially prevent damage to the semiconductor body by energetic vaporized species developed during the coating process. The invention has particular utility in the high volume fabrication of thin film semiconductor devices and may be readily adapted to provide the transparent conductive electrode of photoresponsive devices in a continuous roll-to-roll deposition process.
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Banerjee Arindam
Nath Prem
Ovshinsky Herbert C.
Energy Conversion Devices Inc.
Goldman Richard M.
Nguyen Nam X.
Niebling John F.
Siskind Marvin S.
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