Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface... – With irradiation or illumination
Patent
1997-08-21
2000-06-13
Gorgos, Kathryn
Electrolysis: processes, compositions used therein, and methods
Electrolytic erosion of a workpiece for shape or surface...
With irradiation or illumination
205674, 205675, 205684, 216 94, B23H 300, B23H 500, C25F 300, C25F 700
Patent
active
060745460
ABSTRACT:
A method is provided for photochemical polishing of a silicon wafer using electromagnetic waves within the spectrum of 150 to 2000 nanometers wavelength. A photochemical polishing apparatus is also disclosed in which the electromagnetic waves are provided by a waveguide in close proximity to the surface of a silicon wafer electrode.
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Derwent English Abstract of DE 3608604 A, Sep. 1987.
C. Serre et al., "Characterization of the Electropolishing Layer During Anodic Etching of p-Type Silicon in Aqueous HF Solutions," Journal Electrochemical Soc., vol. 141, No. 8, 1994, pp. 2049-2053 No month available.
Cook Lee Melbourne
Shen James
Sun Lizhong
Benson Kenneth A.
Fricke Hilmar
Gorgos Kathryn
Kaeding Konrad
Nicolas Wesley A.
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