Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1987-06-02
1988-07-26
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
134 3, 156638, 156650, 156655, 156663, 156667, 252 793, 430313, B44C 122, C03C 1500, C03C 2506, C23F 102
Patent
active
047598239
ABSTRACT:
A method for etching thin films of compostions from the PLZT family which have been deposited on substrates. The film is coated with a photosensitive material which is developed by photolithographic techniques to form a photoresist mask upon the film layer, the photoresist material having a predetermined pattern. The thin film coated substrate with the developed photoresist mask is immersed in a dilute etching solution containing hydrochloric acid and fluorine ion donor for a period of time sufficient to etch that portion of the thin film layer not covered with the developed photoresist, removing the thin film coated substrate after it has been etched, rinsing the substrate and then immersing the substrate in a second etching solution containing a dilute solution of a lead solubilizing medium such as nitric acid, or acetic for a period of time sufficient to remove lead residue remaining from the first etching step. The resulting product is a thin film coated substrate having the desired pattern of thin film in a predetermined configuration for use in an integrated circuit.
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Asselanis Dino
Mancha Sylvia D.
Krysalis Corporation
Powell William A.
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