Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Plural fluid growth steps with intervening diverse operation
Reexamination Certificate
2005-05-05
2009-02-17
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
Plural fluid growth steps with intervening diverse operation
C438S500000, C438S507000, C438S758000, C438S800000, C257SE51040, C257SE21090, C977S742000
Reexamination Certificate
active
07491628
ABSTRACT:
A method of assembling large numbers of nanoscale structures in pre-determined ways using fluids or capillary lithography to control the patterning and arrangement of the individual nanoscale objects and nanostructures formed in accordance with the inventive method are provided. In summary, the current method uses the controlled dispersion and evaporation of fluids to form controlled patterns of nanoscale objects or features anchored on a substrate, such as nanoscale fibers like carbon nanotubes.
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Hu
Gharib Morteza
Noca Flavio
Sansom Elijah B.
Zhou Jijie
California Institute of Technology
Christie Parker & Hale, LLP.
Estrada Michelle
Jefferson Quovaunda
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