Method for patterning a metal film

Details Method for patterning a metal film Method for patterning a metal film

1994-08-09

1997-10-21

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566461, 1566561, 20419235, H01L 2100

Patent

active

056792131

ABSTRACT:
A method for patterning a metal film comprises a process of removing a part of the metal film not covered with the mask by means of a dry etching method using argon gas and one of a gas containing an element to make a reactive product of the metal film to be wet-etched, and then removing the reactive product which has adhered to the metal film by means of an organic solvent.

REFERENCES:
patent: 3923568 (1975-12-01), Bersin
patent: 5320709 (1994-06-01), Bowden et al.
patent: 5384009 (1995-01-01), Mak et al.

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