Method for pattern formation and process for preparing...

Details Method for pattern formation and process for preparing... Method for pattern formation and process for preparing...

2005-02-15

2005-02-15

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S311000, C430S318000, C430S322000, C430S325000, C430S945000

Reexamination Certificate

active

06855483

ABSTRACT:
A negative pattern is formed to be transparent in the far ultraviolet region including the wavelength 193 nm of an ArF excimer laser and, despite its chemical structure having high dry etching, does not swell and has excellent resolution. An acid-catalyzed reaction is utilized wherein a γ-hydroxy or δ-hydroxy carboxylic acid structure is partially or entirely converted to a γ-lactone or δ-lactone structure. The negative pattern is developed with an aqueous alkali solution without swelling.

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