X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1995-03-02
1996-08-20
Wong, Don
X-ray or gamma ray systems or devices
Specific application
Lithography
378 85, G21K 500, G21K 104
Patent
active
055486258
ABSTRACT:
A method for performing multiple field parallel processing in x-ray lithography uses a coupled mirror assembly (30) and a coupled mask assembly (22) to define and print multiple fields (54 & 54') in one step. The coupled mirror assembly (30) has multiple mirrored surfaces (34). The coupled mask assembly (22) has as many masks (44) as there are mirrored surfaces (34). The number of masks in the mask assembly define the number image fields that can be printed in parallel during a single exposure step. Thus, the overall cycle time for lithographically exposing an entire semiconductor wafer surface is inversely proportional to the number of parallel image fields.
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Clark Minh-Hien N.
Motorola Inc.
Wong Don
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