Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2007-02-27
2007-02-27
Philogene, Haissa (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111710, C219S121410, C219S121540, C118S7230MP, C118S725000
Reexamination Certificate
active
10997888
ABSTRACT:
A method for operating a semiconductor processing apparatus that plasma-processes a semiconductor wafer mounted on a stage placed in a container using a plasma generated therein. The method includes setting a temperature of the semiconductor wafer, and controlling an operation of the semiconductor processing apparatus based on information about the temperature of the semiconductor wafer which is set.
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Kanai Saburou
Kanno Seiichiro
Kihara Hideki
Nishio Ryoji
Yamamoto Hideyuki
Antonelli, Terry Stout and Kraus, LLP.
Hitachi High-Technologies Corporation
Philogene Haissa
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