Method for nanostructuring of the surface of a substrate

Details Method for nanostructuring of the surface of a substrate Method for nanostructuring of the surface of a substrate

2007-07-03

2010-02-02

Ghyka, Alexander G (Department: 2812)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C438S455000, C438S798000, C257SE21088

Reexamination Certificate

active

07655578

ABSTRACT:
Under consideration here is a method for the production of periodic nanostructuring on one of the surfaces of a substrate (10), presenting a periodic network of dislocations, embedded within a crystalline area (4) located in the neighborhood of an interface (5) between the crystalline material surfaces of two components (1, 2) assembled by bonding to form the substrate (10). It comprises the following steps:formation, in the dislocations (3), of implants (6) made of a material other than that of the crystalline area (4);irradiation of the substrate (10) with electromagnetic waves (11) in order to cause absorption of electromagnetic energy localized in the implants (6), this absorption leading to the appearance of the periodic nanostructuring (12) on the surface of the substrate (10).

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