Method for monitoring fabrication parameter

Details Method for monitoring fabrication parameter Method for monitoring fabrication parameter

2009-05-20

2010-12-21

Garber, Charles D (Department: 2812)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

Reexamination Certificate

active

07855086

ABSTRACT:
A method for monitoring fabrication parameters comprises steps of: obtaining a normal parameter variance curve and a comparing parameter variance curve; defining a plurality of normal parameter points on the normal parameter variance curve; defining a plurality of comparing parameter points on the comparing parameter variance curve; finding out the corresponding comparing parameter points nearest to the normal parameter points; calculating the distances between the normal parameter points and the corresponding comparing parameter points thereof; summing up the distances so as to receive a total distance; and determining whether or not the total distance exceeds a limit. Via this arrangement, when fabrication parameter of tool is abnormal, it can be efficiently and immediately determined.

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patent: 2005/0060336 (2005-03-01), Abercrombie et al.
patent: 2005/0090916 (2005-04-01), Aghababazadeh et al.
patent: 2007/0239383 (2007-10-01), Funk et al.
patent: 2008/0148197 (2008-06-01), Bickford et al.

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