Method for microwave plasma substrate heating

Details Method for microwave plasma substrate heating Method for microwave plasma substrate heating

1997-03-31

2000-02-29

Nguyen, Nam

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427543, 427553, 427575, 427588, 2041923, H05H 100

Patent

active

060306661

ABSTRACT:
A method of microwave heating of a substrate in a plasma processing chamber wherein a heatup gas is supplied into the processing chamber, the heatup process gas is energized with microwave power to heat an exposed surface of the substrate, a reactant gas is supplied into the processing chamber and the reactant gas is energized into a plasma gas state to process the substrate.

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