Method for metallizing a pattern in a dielectric film

Details Method for metallizing a pattern in a dielectric film Method for metallizing a pattern in a dielectric film

2007-08-29

2011-12-20

Lee, Cheung (Department: 2812)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S618000, C438S634000, C257SE21579

Reexamination Certificate

active

08080473

ABSTRACT:
A method of patterning a film stack is described. The method comprises preparing a film stack on a substrate, wherein the film stack comprises a SiCOH-containing layer formed on the substrate, a silicon oxide (SiOx) layer formed on the SiCOH-containing layer, and a mask layer formed on the silicon oxide layer. A pattern is created in the mask layer. Thereafter, the pattern in the mask layer is transferred to the silicon oxide layer using a first etching process, and then the mask layer is removed. The pattern in the silicon oxide layer is transferred to the SiCOH-containing layer using a second etching process formed from a process composition comprising NF3. Thereafter, the silicon oxide layer is removed using a third etching process.

REFERENCES:
patent: 6103619 (2000-08-01), Lai
patent: 6949203 (2005-09-01), Hsieh et al.
patent: 2002/0119677 (2002-08-01), Soda et al.
patent: 2006/0134909 (2006-06-01), Nagase et al.
patent: 2006/0163739 (2006-07-01), Komai et al.
patent: 2007/0004214 (2007-01-01), Schaller et al.
patent: 2007/0032055 (2007-02-01), Standaert et al.
patent: 2007/0161290 (2007-07-01), Fitzsimmons et al.
patent: 2007/0222076 (2007-09-01), Fukasawa et al.
patent: 2007/0232048 (2007-10-01), Miyata et al.
patent: 2007/0243714 (2007-10-01), Shin et al.
patent: 2008/0020570 (2008-01-01), Naik

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