Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Patent
1995-06-07
1996-12-17
Breneman, R. Bruce
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
117 13, 117201, C30B 1520
Patent
active
055849300
ABSTRACT:
A method for measuring a diameter of a single crystal ingot pulled up in a single crystal pulling apparatus comprising: calculating the weight of the pulled-up single crystal, calculating the descent amount of the melt surface relative to the crucible wall from the calculated pulled-up weight of the grown single crystal, and then either correcting the value of the ingot diameter actually measured by the optical sensor in response to the descent amount of the melt surface level or raising the crucible by an amount equal to the descent amount of the surface level.
REFERENCES:
patent: 3493770 (1970-02-01), Dessauer et al.
patent: 3692499 (1972-09-01), Andrychuk
patent: 4539067 (1985-09-01), Washizuka et al.
patent: 4565598 (1986-01-01), Seymour
patent: 4591994 (1986-05-01), Washizuka et al.
patent: 4915775 (1990-04-01), Katsuoka et al.
patent: 4916955 (1990-04-01), Katsuoka et al.
patent: 4926357 (1990-05-01), Katsuoka et al.
patent: 4973377 (1990-11-01), Katsuoka et al.
Baba Masahiko
Hirano Yoshihiro
Katsuoka Nobuo
Ozaki Atsushi
Breneman R. Bruce
Garrett Felisa
Shin-Etsu Handotai & Co., Ltd.
LandOfFree
Method for measuring the diameter of a single crystal ingot does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for measuring the diameter of a single crystal ingot, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for measuring the diameter of a single crystal ingot will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1988289