X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1989-12-20
1991-07-02
Westin, Edward P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 89, 378 56, 378 49, 378 50, 378 54, 378 44, G01B 1502, G01N 23223
Patent
active
050293370
ABSTRACT:
A method of measuring a coating thickness applied on a target of constant base material, such coating containing a non-radioactive labelling material having an atomic number higher than 20. The method includes applying a source of constant gamma or x-rays substantially perpendicular from the center of the face of a detector to a target of unknown coating and to a calibration target of the same base material of known coating to cause the labelling material to emit characteristic fluorescent x-ray ranges from 4-90 kev, measuring the fluorescent x-ray and compton yields of the calibration target, measuring the fluorescent x-ray and compton yields of the target of unknown coating, deriving the source-target distance for the unknown coating from the compton yields, deriving the expected fluorescent x-ray of the calibration target of known coating at said distance, and comparing the measured fluorescent x-ray for the unknown coating to the expected fluorescent x-ray derived at said distance to obtain the coating thickness for the unknown coating. The constant source may be eliminated by measuring the ratio of compton and Rayleigh yields. For targets of variable base thickness, the center of the compton profile is measured.
REFERENCES:
patent: 3703726 (1972-11-01), Stephenson
MacKenzie Innes K.
Stone Robert J.
Tava Corporation
Westin Edward P.
Wong Don
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