Method for matching two measurement methods for measuring...

Radiant energy – Inspection of solids or liquids by charged particles – Methods

Reexamination Certificate

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C250S306000, C250S311000, C250S310000, C382S145000

Reexamination Certificate

active

11052467

ABSTRACT:
The invention relates to a method for matching a first measurement method for measuring structure widths of trapezoidally tapering structures on a substrate wafer to a second measurement method for measuring the structure widths. This is performed in order to obtain measured values for the structure width which are comparable with one another. The second measurement method is suitable for measuring a second structure width at an unknown second height above the surface of the substrate, and the first measurement method is suitable for measuring a first structure width at a first height, the first height being settable.

REFERENCES:
patent: 6566655 (2003-05-01), Choo et al.
patent: 6943900 (2005-09-01), Niu et al.
patent: 2002/0090744 (2002-07-01), Brill et al.
patent: 2003/0204326 (2003-10-01), Opsal et al.
patent: 2005/0100205 (2005-05-01), Shishido et al.
patent: WO 02/13 232 (2002-02-01), None
patent: WO 03/073 494 (2003-09-01), None
patent: WO 03/074 995 (2003-09-01), None
patent: WO 03/081 662 (2003-10-01), None

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