Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-03-28
1989-06-27
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 427 38, C23C 1434, B05D 306
Patent
active
048427055
ABSTRACT:
A method for applying a transparent, conductive indium-tin oxide coating on a substrate of amorphous, hydrogen-containing silicon wherein an unheated substrate of amorphous hydrogen-containing silicon is treated with sources of indium and tin in a first stage while maintaining a low partial pressure of oxygen until a partial coating is built-up, then reducing the oxygen partial pressure in the coating zone in a second stage and continuing the coating until an additional coating thickness is built-up, followed by heating the coated substrate in an oxygen-containing atmosphere at a temperature less than 250.degree. C.
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Nguyen Nam X.
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