Method for manufacturing thin films of multi-element group oxide

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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427255394, 427 99, C23C 1640, C23C 1634

Patent

active

061625019

ABSTRACT:
A method of manufacturing thin films formed from multi-element group oxide includes supplying precursors containing elements later forming an oxide layer into a reaction chamber containing a semiconductor substrate on which an under-layer is formed, reacting an oxidizing gas supplied into the reaction chamber with the precursors to form the oxide layer on the under-layer, and supplying an organic ligand into the reaction chamber to improve planarity of the surface of the oxide layer.

REFERENCES:
patent: 4992306 (1991-02-01), Hochberg et al.
patent: 5431958 (1995-07-01), Desu et al.
patent: 5670218 (1997-09-01), Baek
patent: 5728603 (1998-03-01), Emesh et al.

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