Method for manufacturing thin film, and thin film

Details Method for manufacturing thin film, and thin film Method for manufacturing thin film, and thin film

2005-04-05

2005-04-05

Smith, Matthew (Department: 2825)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S678000, C438S758000, C438S763000, C438S780000, C438S782000, C427S098400, C427S169000, C427S447000, C427S471000

Reexamination Certificate

active

06875642

ABSTRACT:
A method for manufacturing thin film and a thin film. The method comprises dipping a substrate in a solution that dries up forming a layer on the surface of the substrate and controlling layer thickness by changing the rate of dipping the substrate in the solution. Before the next dipping after the first dipping, the position of the substrate is changed such that the next dipping will be carried out in a direction which is at an angle to the direction of the previous dipping.

REFERENCES:
patent: 4661428 (1987-04-01), Ishida
patent: 4775820 (1988-10-01), Eguchi et al.
patent: 5405710 (1995-04-01), Dodabalapur et al.
patent: 5854139 (1998-12-01), Aratani et al.
patent: 6208423 (2001-03-01), Voipio et al.
patent: 6495456 (2002-12-01), Kanoh et al.
patent: 6607981 (2003-08-01), Takahashi et al.
patent: 20010046107 (2001-11-01), Irie et al.
patent: 20020004180 (2002-01-01), Hotta et al.
patent: 61-022349 (1986-01-01), None
patent: 03-142403 (1991-06-01), None
patent: 05-334721 (1993-12-01), None
Finnish Search Report issued in Finnish Application No. 20012304.
C. Jeffrey Brinker et al, “SOL-GEL SCIENCE, The Physics and Chemistry of Sol-Gel Processing,” Academic Press, Inc., pp. 2-13, 788, 789 and 794-797 (1990).

Affiliated with

Also associated with

Rating

Method for manufacturing thin film, and thin film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing thin film, and thin film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing thin film, and thin film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3382735