Method for manufacturing thermal interface material having...

Details Method for manufacturing thermal interface material having... Method for manufacturing thermal interface material having...

2008-07-11

2011-11-01

Tran, Binh X (Department: 1713)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S008000, C216S074000, C216S096000, C977S742000

Reexamination Certificate

active

08048322

ABSTRACT:
A method for manufacturing a thermal interface material includes the following steps: providing a carbon nanotube array formed on a substrate, the carbon nanotube array having a number of carbon nanotubes and a number of interstices between the adjacent carbon nanotubes; filling a liquid state first base material into the interstices; curing the first base material, thereby achieving a carbon nanotube/first base material composite; dripping a liquid state second base material onto the surface of the carbon nanotube/first base material composite, the first base material melting and flowing out of the carbon nanotube/first base material composite, until the carbon nanotube array being substantially submerged in the second base material; and curing the second base material, thereby achieving a thermal interface material.

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