Method for manufacturing semiconductor device

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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Details

C029S825000, C029S840000, C029S852000, C361S761000, C361S764000, C427S097100

Reexamination Certificate

active

06256875

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a method for manufacturing a semiconductor device comprising a printed circuit board type ball grid array (hereinafter referred to as a BGA) and a package for the semiconductor device and, more particularly, to a method for manufacturing a semiconductor device comprising a printed circuit board type BGA package in which a plurality of printed wiring boards are laminated, and a package for the semiconductor device.
2. Description of the Background Art
FIG. 57
is a sectional view showing the structure of a semiconductor device according to the prior art. In
FIG. 57
, the reference numeral
1
designates a semiconductor device comprising a printed circuit board type BGA package, the reference numeral
2
designates a chip provided in the semiconductor device
1
, the reference numeral
3
designates a slug on which the chip
2
is placed, the reference numeral
4
designates a die bonding resin which bonds the chip
2
to the slug
3
, the reference numeral
5
designates a frame that is provided around the chip
2
and has one of main surfaces to which the slug
3
is bonded, the reference numeral
6
designates an adhesive bonding the frame
5
to the slug
3
, the reference numeral
7
designates a solder ball formed on the other main surface of the frame
5
, the reference numeral
8
designates a wire electrically connecting the chip
2
to the frame
5
, the reference numeral
9
designates a cavity formed in the central portion of the frame
5
to housing the chip
2
therein, the reference numeral
10
designates a sealing resin for filling in the cavity
9
to seal the chip
2
, and the reference numeral
11
designates a dam which is formed on the other main surface of the frame
5
enclosing an opening and preventing the sealing resin
10
from flowing out.
The frame
5
comprises two double-sided printed circuit boards
15
and
16
which are laminated, and a prepreg
17
for bonding them. The double-sided printed circuit board
15
has wiring layers
19
and
20
provided on both sides of an insulating substrate
18
. The double-sided printed circuit board
16
has wiring layers
22
and
23
provided on both sides of an insulating substrate
21
.
The wiring layers
19
and
20
and the wiring layers
22
and
23
provided on both sides of the double-sided printed circuit boards
15
and
16
are wired by interstitial via holes, respectively. The double-sided printed circuit boards
15
and
16
are wired by a through hole
24
.
The exchange of a signal and power between the chip
2
and a board on which the semiconductor device
1
is placed occurs through the wire
8
, the wiring layers
19
,
20
,
22
and
23
, the through hole
24
, an interstitial via hole
25
, the solder ball
7
and the like.
A method for manufacturing the printed circuit board type BGA package according to the prior art shown in
FIG. 57
will be described below with reference to
FIGS. 43
to
57
.
First of all, a double-sided printed circuit board
15
having copper foils
30
and
31
laminated on both sides is prepared (see FIG.
43
).
Then, a hole
32
for an interstitial via hole which penetrates the double-sided printed circuit board
15
is formed (see FIG.
44
). The double-sided printed circuit board
15
on which the hole
32
is formed is plated with copper so that a copper plated layer
33
is formed. Thus, an interstitial via hole
25
is formed (see FIG.
45
). As shown in
FIG. 46
, the interstitial via hole
25
is filled with a resin
34
. Consequently, no gap which penetrates the double-sided printed circuit board
15
is present. Then, a wiring layer
20
of the double-sided printed circuit board
15
is patterned (see FIG.
47
).
After performing the same steps as the steps shown in
FIGS. 43
to
47
, a double-sided printed circuit board
16
is prepared in which the interstitial via hole
25
that is filled with the resin
34
is formed and a wiring layer
22
is patterned (see FIG.
48
). The double-sided printed circuit board
16
comprises copper foils
35
and
36
, and a copper plated layer
37
formed thereon.
Then, the double-sided printed circuit board
15
shown in FIG.
47
and the double-sided printed circuit board
16
shown in
FIG. 48
are bonded together by prepreg
17
. Consequently, a laminated printed circuit board
38
is formed as an aggregate of the double-sided printed circuit boards
15
and
16
(see FIG.
49
). A chamber
39
for forming a cavity
9
shown in
FIG. 57
is provided between the double-sided printed circuit boards
15
and
16
in the central portion of the laminated printed circuit board
38
. A hole
40
which penetrates the laminated printed circuit board
38
is formed in a region
41
of the laminated printed circuit board
38
where the prepreg
17
is inserted (see FIG.
50
). The laminated printed circuit board
38
in which the hole
40
is formed is plated with copper so that a copper plated layer
42
is formed. Thus, a through hole
24
is formed (see FIG.
51
). The laminated printed circuit board
38
is immersed in a plating solution so as to be plated with copper. However, the interstitial via hole
25
has been filled with a resin so that the chamber
39
has been sealed. For this reason, the plating solution does not invade the chamber
39
.
Subsequently, the through hole
24
is filled with a resin
43
as shown in FIG.
52
. Then, a wiring layer
19
is patterned (see FIG.
53
). At the same time, the copper foil
30
and the copper plated layers
33
and
42
of the wiring layer
19
which are provided in an upper region
44
of the chamber
39
are removed. An insulating substrate
18
provided in the upper region
44
is opened by a router so that an opening
45
is formed. After that, nickel-gold plating is performed so that a nickel-gold plated layer
46
is formed on the copper plated layers
37
and
42
(see FIG.
54
).
As shown in
FIG. 55
, a wiring layer
23
is patterned. At the same time, the copper foil
35
and the copper plated layers
37
and
42
which are provided in a lower region
47
of the chamber
39
are removed. As shown in
FIG. 56
, an opening
48
is formed in the lower region
47
so that a frame
5
is completed. A slug
3
is bonded to the frame
5
with an adhesive
6
.
The chip
2
is bonded to the slug
3
with a die bonding resin
4
and the chip
2
is connected to the nickel-gold plated layer
46
by a wire
8
. After a dam
11
is put in place, the cavity
9
is filled with a sealing resin
10
so that a package is sealed. Then, a solder ball
7
is formed on the nickel-gold plated layer
46
of the wiring layer
19
. Thus, the printed circuit board type BGA package is completed (see FIG.
57
).
The semiconductor device and the method for manufacturing the semiconductor device according to the prior art have the above-mentioned structure. Therefore, the copper plated layers
33
and
37
are formed on the copper foils
31
and
36
of the wiring layers
20
and
22
, and the copper plated layer
33
or
37
and the copper plated layer
42
are formed doubly on the copper foils
30
and
37
of the wiring layers
19
and
23
. Consequently, the thicknesses of the wiring layers
19
,
20
,
22
and
23
become greater. For this reason, it is hard to reduce the pitches of patterns formed on the wiring layers
19
,
20
,
22
and
23
.
The above-mentioned problem will be described below with reference to
FIGS. 58 and 59
.
FIG. 58
is a sectional view showing the state in which a wiring layer
50
A is formed by a copper foil
52
and a copper plated layer
51
and a pattern is formed at a minimum pitch. The formed pattern has a predetermined inclination
53
which depends on the conditions of patterning. In
FIG. 58
, the reference numeral
55
designates a space between patterns which is required at the minimum, and the reference numeral
54
designates a pattern pitch.
FIG. 59
is a sectional view showing the state in which a wiring layer
50
B is formed by only the copper foil
52

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