Method for manufacturing resonant device

Details Method for manufacturing resonant device Method for manufacturing resonant device

2006-08-01

2006-08-01

Norton, Nadine G. (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

Etching inorganic substrate

C216S075000, C216S080000

Reexamination Certificate

active

07083740

ABSTRACT:
A piezoelectric member and an electrode are formed over a silicon substrate. The piezoelectric member and the electrode are patterned by photolithography. The silicon substrate is etched to form a body. A protective film is formed on at least one surface of the body. Another surface having no protective film thereon is etched to obtain a resonant device. The body is etched in its thickness direction accurately while a resonance frequency of the body is measured. The manufacturing processes allow the resonance frequency and a gap frequency of the resonant device to be adjusted to predetermined values.

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