Method for manufacturing probe structure of probe card

Details Method for manufacturing probe structure of probe card Method for manufacturing probe structure of probe card

2011-01-25

2011-01-25

Deo, Duy-Vu N (Department: 1713)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S011000, C216S041000

Reexamination Certificate

active

07875193

ABSTRACT:
A method for manufacturing a probe structure of a probe card is disclosed. In accordance with the present invention, a portion of a substrate exposed through a crossing region of one more probe beam regions defined by a first mask layer pattern and a windows defined by a second mask layer pattern are etched to form one or more self-aligning probe tip regions, thereby preventing a misalignment of the one or more probe tip regions.

REFERENCES:
patent: 6059982 (2000-05-01), Palagonia et al.
patent: 7018857 (2006-03-01), Kanamaru et al.
patent: 7528618 (2009-05-01), Gritters
patent: 7602204 (2009-10-01), Lee

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