Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2005-06-07
2005-06-07
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C430S322000, C430S323000, C430S325000, C385S122000
Reexamination Certificate
active
06902871
ABSTRACT:
A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.
REFERENCES:
patent: 4004044 (1977-01-01), Franco et al.
patent: 4362598 (1982-12-01), Griffing
patent: 4532002 (1985-07-01), White
patent: 5007696 (1991-04-01), Thackara et al.
patent: 5039186 (1991-08-01), Man et al.
patent: 5120339 (1992-06-01), Markovich et al.
patent: 5133037 (1992-07-01), Yoon et al.
patent: 5198513 (1993-03-01), Clement et al.
patent: 5219788 (1993-06-01), Abernathey et al.
patent: 5223356 (1993-06-01), Kumar et al.
patent: 5340774 (1994-08-01), Yen
patent: 5370969 (1994-12-01), Vidusek
patent: 5433895 (1995-07-01), Jeng et al.
patent: 5480687 (1996-01-01), Heming et al.
patent: 5494777 (1996-02-01), Shiraki et al.
patent: 5635576 (1997-06-01), Foll et al.
patent: 5714304 (1998-02-01), Gibbons et al.
patent: 5776374 (1998-07-01), Newsham et al.
patent: 5783319 (1998-07-01), Reisfeld et al.
patent: 5811507 (1998-09-01), Chan et al.
patent: 5861976 (1999-01-01), Hoekstra
patent: 6002828 (1999-12-01), Hult et al.
patent: 6019906 (2000-02-01), Jang et al.
patent: 6031945 (2000-02-01), You et al.
patent: 6126867 (2000-10-01), Kanitz et al.
patent: 6294573 (2001-09-01), Curtin et al.
patent: 6303730 (2001-10-01), Fries et al.
patent: 6306563 (2001-10-01), Xu et al.
patent: 6323361 (2001-11-01), Wu et al.
patent: 6335149 (2002-01-01), Xu et al.
patent: 6419989 (2002-07-01), Betz et al.
patent: 6458516 (2002-10-01), Ye et al.
patent: 6734436 (2004-05-01), Faris et al.
patent: 2002/0039464 (2002-04-01), Yoshimura et al.
patent: 2002/0125443 (2002-09-01), Sandstrom
patent: 0 617 303 (1994-09-01), None
Bailey et al., “Step and flash imprint lithography: Template surface treatment and defect analysis,”J. Vac. Sci. Technol. B, 2000, 18(6):3572-3577.
Chen et al., “Thermosetting Polyurethanes with Stable and Large Second-Order Optical Nonlinearity,”Macromolecules, 1992, 25:4032-4035.
Grote et al., “Effect of conductivity and dielectric constant on the modulation voltage for optoelectronic devices based on nonlinear optical polymers,”Opt. Eng., 2001, 40(11):2464-2473.
Ma et al., “A Novel Class of High-Performance Perfluorocyclobutane-Containing Polymers for Second-Order Nonlinear Optics,”Chem. Mater., 2000, 12:1187-1189.
Ma et al., “Highly Efficient and Thermally Stable Nonlinear Optical Dendrimer for Electrooptics,”J. Am. Chem. Soc., 2001, 123:986-987.
Mao et al., “Progress toward Device-Quality Second-Order Nonlinear Optical Materials. 1. Influence of Composition and Processing Conditions on Nonlinearity, Temporal Stability, and Optical Loss,”Chem. Mater., 1998, 10:146-155.
Oh et al., “Electro-optic polymer modulators for 1.55 μm wavelength using phenyltetraene bridged chromophore in polycarbonate,”Appl. Phys. Lett., 2000, 76(24):3525-3527.
Resnick et al., “Release Layers for Contact and Imprint Lithography,”Semicon. Int., Jun. 2002, online version, 7 pgs.
Bintz Louis J.
Dinu Raluca
Kressbach Jeffrey K.
Lumera Corporation
Walke Amanda
LandOfFree
Method for manufacturing polymer microstructures and polymer... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing polymer microstructures and polymer..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing polymer microstructures and polymer... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3502690