Method for manufacturing photoresist having nanoparticles

Details Method for manufacturing photoresist having nanoparticles Method for manufacturing photoresist having nanoparticles

2007-12-11

2007-12-11

Visconti, Geraldina (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S270100, C430S325000, C430S328000, C430S331000

Reexamination Certificate

active

11492283

ABSTRACT:
An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions (211); adding a sulfide containing sulfur ions (231) into the aqueous solution; adding a polymerizable surfactant (220) into the aqueous solution thereby forming metallic ion reverse micelles (210) and sulfur ion reverse micelles (230); reacting the metallic ion reverse micelles and the sulfur ion reverse micelles to create monomeric sulfureted metal nanoparticle reverse micelles (240); aggregating the monomeric sulfureted metal nanoparticle reverse micelles to polymeric macromolecular nanoparticles; and doping the polymeric macromolecules nanoparticles into a base material in order to obtain the photoresist having sulfureted metal nanoparticles. A diameter of the nanoparticles is in the range from 1×10−9meters to 1×10−7meters.

REFERENCES:
patent: 6613499 (2003-09-01), Chang
patent: 6716897 (2004-04-01), Okutsu et al.
patent: 2002/0187438 (2002-12-01), Chang

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