Method for manufacturing phase-shifting mask

Details Method for manufacturing phase-shifting mask Method for manufacturing phase-shifting mask

1997-04-22

1999-08-03

Wilczewski, Mary

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

438942, 438948, 430 5, 430313, 430315, 430322, 430324, 148DIG106, 216 41, 216 48, 216 51, G03F 900, G03F 712

Patent

active

059324899

ABSTRACT:
A method for manufacturing phase-shifting masks utilizing a photolithographic process and sidewall spacers to fabricate a phase-shifting layer. The method provides precise control over the shape and size of the resulting phase-shifting layer, and thus, simplifies photomask production.

REFERENCES:
patent: 5268244 (1993-12-01), Yoo
patent: 5288568 (1994-02-01), Cathey, Jr.
patent: 5382483 (1995-01-01), Young
patent: 5455131 (1995-10-01), Kang et al.
patent: 5536606 (1996-07-01), Doan
patent: 5567552 (1996-10-01), Ham
patent: 5591549 (1997-01-01), Yang
patent: 5595843 (1997-01-01), Dao
patent: 5658695 (1997-08-01), Choi

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