Method for manufacturing patterned thin-film layer

Details Method for manufacturing patterned thin-film layer Method for manufacturing patterned thin-film layer

2007-11-28

2010-11-23

Duda, Kathleen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000, C430S321000, C347S101000

Reexamination Certificate

active

07838202

ABSTRACT:
A method for manufacturing a patterned thin-film layer includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces therein for receiving ink therein, each of the banks having a top surface; providing a UV light source for emitting UV light toward the substrate; disposing a photo mask between the UV light source and the substrate; applying UV light on the substrate through the photo mask so as to reduce surface wettability of the ink on the top surfaces of the substrate, wherein the UV light is applied in a manner that the top surfaces of the banks are blocked by the photo mask and thus free of radiation from the UV light emitted from the UV light source; applying the ink into the spaces; and curing the ink so as to form a patterned thin-film layer on the substrate.

REFERENCES:
patent: 2002/0067400 (2002-06-01), Kawase et al.

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