Method for manufacturing pattern of light shielding layer...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S315000, C430S321000, C430S320000, C430S330000, C430S324000, C430S322000

Reexamination Certificate

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07569330

ABSTRACT:
A method for manufacturing a pattern of a light shielding layer and a patter forming body of light shielding layer. After placing a photocatalyst containing layer side substrate having a base material and a photocatalyst containing layer, and a pattern forming body substrate having a substrate and a property changing layer, the property of an exposed part changes by the action of a photocatalyst in a photocatalyst containing layer, to form a wettability pattern having a lyophilic region and a liquid repellent region on the property changing layer. A light shielding layer composition is coated on the whole surface of the pattern forming body substrate on which the above-mentioned wettability pattern is formed, adhering and solidifying a light shielding layer composition only to the lyophilic region, to form a light shielding layer pattern.

REFERENCES:
patent: 2003/0087073 (2003-05-01), Kobayashi
patent: 2004/0043334 (2004-03-01), Kobayashi et al.
patent: 2000-249821 (2000-09-01), None

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