Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate
2005-04-06
2008-10-21
Everhart, Caridad M (Department: 2891)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
C438S799000, C257SE21027, C257SE21035
Reexamination Certificate
active
07439196
ABSTRACT:
The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like.In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a photocatalyst-containing property variable layer which is formed on the base material, comprises at least a photocatalyst and a binder, and has a property variable by action of the photocatalyst based on irradiation with energy; and an energy radiating process of radiating energy onto the patterning substrate at an intensity of 0.1 to 10 mW/cm2, thereby forming a property variable pattern in which the property of the photocatalyst-containing property variable layer is varied.
REFERENCES:
patent: 6093676 (2000-07-01), Heller et al.
patent: 2002/0012856 (2002-01-01), Ohtsu et al.
patent: 2005/0028698 (2005-02-01), Mori et al.
patent: 2001-074928 (2001-03-01), None
Kobayashi Hironori
Uno Yusuke
DAI Nippon Printing Co., Ltd.
Everhart Caridad M
Ladas & Parry LLP
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