Method for manufacturing pattern formed structure

Details Method for manufacturing pattern formed structure Method for manufacturing pattern formed structure

2011-01-11

2011-01-11

Smith, Matthew S (Department: 2823)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

Ionized irradiation

C438S796000, C257SE21027, C257SE21035

Reexamination Certificate

active

07867925

ABSTRACT:
The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like. In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a property variable layer which is formed on the base material and has a property variable by action of a photocatalyst based on irradiation with energy; and an energy radiating process of arranging a photocatalyst containing layer side substrate having a base body and a photocatalyst containing layer comprising at least the photocatalyst, and the patterning substrate so as to keep a given interval between the photocatalyst containing layer and the property variable layer, and then radiating energy onto the resultant at an intensity of 0.1 to 10 mW/cm2, thereby forming a property variable pattern in which the property of the property variable layer is varied.

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