Method for manufacturing panes with high transmissivity in the v

Details Method for manufacturing panes with high transmissivity in the v Method for manufacturing panes with high transmissivity in the v

1992-02-20

1994-01-18

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419226, C23C 1434

Patent

active

052797228

ABSTRACT:
Method for the manufacture of panes with high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation. The panes are coated by cathode sputtering. To the substrates S there is applied a first coating of a material of the oxide group ZnO, SnO.sub.2, In.sub.2 O.sub.3, TiO.sub.2, ZrO.sub.2, TaO.sub.5, SiO.sub.2, Al.sub.3 O.sub.3, or mixtures thereof, or of one of the nitrides AlN, Si.sub.3 N.sub.4 or their mixtures, or of aluminum oxynitride, titanium oxynitride, zirconium oxynitride or silicon oxynitride or their mixtures, in a thickness of 20 to 60 nm. A second layer 2 follows, of one of the metals Ag, Cu or mixtures thereof, in a thickness of 5 to 30 nm, a third layer 3 of one of the metals Pd or Pt or their mixtures, in a thickness of 0.2 to 5 nm, preferably 0.5 nm, and a fourth layer 4 which, as a metallic or suboxidic (less than stoichiometric) layer of one of the metals Ti, Cr or mixture thereof, or of an alloy with at least 15% of one of the metals, in a thickness of 0.5 to 5 nm, preferably 1.5 nm. Lastly, a fifth layer 5 is applied, of a metal that is the same as that of the first layer 1.

REFERENCES:
patent: 4098956 (1978-07-01), Blickensderfer et al.
patent: 4534841 (1985-08-01), Hartig et al.
patent: 4548691 (1985-10-01), Dietrich et al.
patent: 4790922 (1988-12-01), Huffer
patent: 4938857 (1990-07-01), Gillery
JP 63-238260 A., In: Patents Abstracts of Japan, C-563, Jan. 27, 1989, vol. 13, No. 39.

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