Method for manufacturing optical device

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S048000, C438S050000, C438S052000

Reexamination Certificate

active

07601551

ABSTRACT:
A method for manufacturing an optical device having an optical block, through which a light is transmitted, is provided. The method includes steps of: forming a plurality of silicon oxide members, which is disposed on a silicon substrate, wherein the silicon oxide members are arranged in parallel each other by a predetermined clearance between two adjacent silicon oxide members; and pouring a super critical fluid into the clearance so that the clearance is filled with a product formed from a predetermined compound for forming the optical block, wherein the predetermined compound is dissolved in the super critical fluid.

REFERENCES:
patent: 6277756 (2001-08-01), Ohara et al.
patent: 6630389 (2003-10-01), Shibata et al.
patent: 6721476 (2004-04-01), Padmanabhan et al.
patent: 2003/0123827 (2003-07-01), Salerno et al.
patent: 2004/0173862 (2004-09-01), Oohara et al.
patent: 2007/0069318 (2007-03-01), Takeuchi et al.
Office Action mailed issued on Apr. 21, 2009 from the German Patent Office in the corresponding German patent application No. 10 2006 041 996.0-51 (with English translation).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing optical device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing optical device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing optical device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4107118

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.