Method for manufacturing microlens

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S394000

Reexamination Certificate

active

07575854

ABSTRACT:
A main object of the present invention is to provide a method for manufacturing a microlens that can easily form a microlens having a smooth shape, in which a maximum thickness position is different from a gravity center position. To attain the object, the present invention provides a method for manufacturing a microlens comprising processes of: a basic shape forming-exposure process for performing exposure by using a microlens basic shape-forming mask to a photosensitive resin layer formed on a substrate; and a deforming-exposure process for performing exposure, with a unit cell-exposure profile different from that of the exposure performed in the basic shape forming-exposure process, to the photosensitive resin layer by using a microlens-shape-adjusting mask, wherein a microlens, having a maximum thickness position different from a gravity center position is formed.

REFERENCES:
patent: 2005/0105188 (2005-05-01), Hayashi et al.
patent: 2002-076315 (2002-03-01), None
patent: 2004-310077 (2004-11-01), None
patent: 2005-258349 (2005-09-01), None
patent: WO 2005/008781 (2005-01-01), None
Computer-generated translation of JP 2004-310077 (Nov. 2004).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing microlens does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing microlens, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing microlens will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4128275

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.