Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1991-04-05
1997-05-13
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
4272551, C23C 1634
Patent
active
056290535
ABSTRACT:
The method of the present invention provides in a simple manner, the deposition of boron nitride layers with microcrystalline cubic structure which are suitable as insulating layers in VLSI-circuits, as mask membranes in x-ray lithography, as well as coating hard substances. Due to the use of excited starting substances that already contain boron and nitrogen in one molecule and are preferably liquid or solid, and the use of a plasma-CVD-method, the method can be performed using in temperatures of below 500.degree. C. The excitation of the starting substance proceeds preferably in inductive or capacitative fashion in a hollow cathode.
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Braun Rainer
Kruck Thomas
Neureither Bernhard
Spindler Oswald
Treichel Helmuth
Beck Shrive
Meeks Timothy
Siemens Aktiengesellschaft
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