Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1994-09-19
1996-08-06
Fourson, George
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 99, 437228, 437234, 205656, 205661, H01L 21306
Patent
active
055425585
ABSTRACT:
A method for manufacturing micro-mechanical components in which a structure is produced on a silicon layer, which is to be undercut in a further step. The silicon is selectively anodized for this undercutting operation. Thus, the method enables the manufacturing of micro-mechanical components that can be integrated together with bipolar circuit elements.
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Bantien Frank
Benz Gerhard
Laermer Franz
Marek Jiri
Muenzel Horst
Bilodeau Thomas G.
Fourson George
Robert & Bosch GmbH
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