Method for manufacturing metal structure having different...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07148141

ABSTRACT:
Disclosed is a method for forming a plurality of metal structures having different heights on a semiconductor substrate. The disclosed method for manufacturing a metal structure having different heights includes: forming a plurality of seed layers, to have heights corresponding to the metal structure to be formed, on a semiconductor substrate so that those layers can be electrically separated, performing a plating process using a plating mold, and applying different currents to the respective seed layers so that the plating thickness can be adjusted for each of the seed layers. Accordingly, a plurality of metal structures having different heights can be obtained by a plating mold forming process and a plating process that are performed just once, respectively.

REFERENCES:
patent: 2002/0017553 (2002-02-01), Jao
patent: 2003/0080431 (2003-05-01), Uzoh et al.
patent: 2005/0045484 (2005-03-01), Smalley et al.
patent: 10-98268 (1998-04-01), None
patent: 10-135156 (1998-05-01), None
patent: 10135156 (1998-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing metal structure having different... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing metal structure having different..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing metal structure having different... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3689078

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.