Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2004-04-23
2008-05-13
Young, Christopher G. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S296000, C430S942000
Reexamination Certificate
active
07371483
ABSTRACT:
Disclosed is a method for manufacturing a mask for focus monitoring, comprising forming a first opening portion and a second opening portion in a surface region of a transparent substrate, the second opening portion having a pattern shape corresponding to a pattern shape of the first opening portion, and being surrounded by a stack film formed of a halftone film on the transparent substrate and an opaque film on the halftone film, and radiating a charged beam onto a first region which includes an edge of the second opening portion and inside and outside regions which are respectively located inward and outward of the edge of the second opening portion, to etch that part of the transparent substrate which corresponds to the inside region.
REFERENCES:
patent: 6440616 (2002-08-01), Izuha et al.
patent: 7094504 (2006-08-01), Izuha et al.
patent: 07-056322 (1995-03-01), None
patent: 2001-100392 (2001-04-01), None
patent: 2001-343733 (2001-12-01), None
patent: 2002-299205 (2002-10-01), None
patent: 2002-311568 (2002-10-01), None
Notification of Reasons for Rejection from Japanese Patent Office dated Feb. 7, 2006 in Japanese Application No. 2003-122339, and English translation thereof.
Izuha, K. et al., “Mask, Manufacturing Method for Mask, And Manufacturing Method for Semiconductor Device”, U.S. Appl. No. 10/668,245, filed Sep. 24, 2003.
Hirano Takashi
Inoue Soichi
Ito Shin'ichi
Izuha Kyoko
Kanamitsu Shingo
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Young Christopher G.
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