Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-04-20
2008-08-26
Le, Thao X. (Department: 2892)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257SE21305
Reexamination Certificate
active
07416977
ABSTRACT:
An object of the present invention is to provide a method for manufacturing a display device with few steps and high yield. One feature of the invention is to form a first mask pattern having low wettability over a conductive layer, form a second mask pattern having high wettability over the conductive layer using the first mask pattern as a mask, and form a mask pattern for etching the conductive layer by removing the first mask pattern. Another feature is to form a pixel electrode by etching the conductive layer.
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Fujii Gen
Fukuchi Kunihiko
Isa Toshiyuki
Costellia Jeffrey L.
Le Thao X.
Nixon & Peabody LLP
Semiconductor Energy Laboratory Co,. Ltd.
Ullah Elias
LandOfFree
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