Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-12-05
2006-12-05
Parker, Kenneth (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S413000, C257SE21122, C438S455000
Reexamination Certificate
active
07145212
ABSTRACT:
A method (and resultant structure) of forming a semiconductor device, includes forming a metal-back-gate over a substrate and a metal back-gate, forming a passivation layer on the metal back-gate to prevent the metal back-gate from reacting with radical species, and providing an intermediate gluing layer between the substrate and the metal back-gate to enhance adhesion.
REFERENCES:
patent: 4771016 (1988-09-01), Bajor et al.
patent: 4826787 (1989-05-01), Muto et al.
patent: 4927505 (1990-05-01), Sharma et al.
patent: 5250460 (1993-10-01), Yamagata et al.
patent: 5387555 (1995-02-01), Linn et al.
patent: 5391257 (1995-02-01), Sullivan et al.
patent: 5872385 (1999-02-01), Taft et al.
patent: 6049114 (2000-04-01), Maiti et al.
patent: 6057212 (2000-05-01), Chan et al.
patent: 6218274 (2001-04-01), Komatsu
patent: 6238737 (2001-05-01), Chan et al.
patent: 6255731 (2001-07-01), Ohmi et al.
patent: 6362075 (2002-03-01), Czagas et al.
patent: 6373114 (2002-04-01), Jeng et al.
Chan Kevin K.
Huang Lijuan
McFeely Fenton R.
Solomon Paul M.
Wong Hon-Sum Philip
Cheung, Esq. Wan Yee
Diaz José R.
International Business Machines - Corporation
McGinn IP Law Group PLLC
Parker Kenneth
LandOfFree
Method for manufacturing device substrate with metal... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing device substrate with metal..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing device substrate with metal... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3665783