Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-09-30
1988-07-12
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 430270, C23C 1434
Patent
active
047568119
ABSTRACT:
There is disclosed a method for manufacturing a bubble-mode optical disk having a recording layer made of a mixture of an indium oxide matrix containing indium clusters and organic clusters. The indium clusters absorb an energy of incident laser beam to heat the organic clusters which then release a gas component such that the matrix is locally deformed to form a protuberance. A plasma sputtering is used to deposit the recording layer on a disk substrate placed in a sputtering chamber. A target body used is made of indium. A low-pressure gaseous atmosphere in the chamber includes a methane series hydrocarbon gas and an oxygen gas. The gaseous atmosphere may include a hydrogen gas or a nitrogen gas.
REFERENCES:
patent: 4499178 (1985-02-01), Wada et al.
patent: 4565772 (1986-01-01), Takeoka et al.
patent: 4579807 (1986-04-01), Blonder et al.
patent: 4647947 (1987-03-01), Takeoka et al.
Ozawa Norio
Takeoka Yoshikatsu
Yasuda Nobuaki
Kabushiki Kaisha Toshiba
Nguyen Nam X.
Niebling John F.
LandOfFree
Method for manufacturing bubble-mode optical recording media does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing bubble-mode optical recording media, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing bubble-mode optical recording media will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-662676