Method for manufacturing anisotropic conductive sheet

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07442560

ABSTRACT:
In order to provide an anisotropic conductive sheet which can be applied to more finely and more narrowly pitched electrodes and also to provide spring electrodes applied for the anisotropic conductive sheet, the spring electrodes manufactured as follows. A part having a bending leaf spring shape is formed out of a monocrystal silicon by anisotropic etching and gold is plated on the surface of the part so as to obtain a silicon spring electrode1. The silicon spring electrodes1are inserted in through holes formed on a silicone rubber sheet and fixed to the through holes.

REFERENCES:
patent: 5188702 (1993-02-01), Takayama et al.
patent: 56/48951 (1981-11-01), None
patent: 2001/291430 (2001-10-01), None
patent: 2003/121468 (2003-04-01), None
patent: 2003-121468 (2003-04-01), None
Kovacs et al., “Bulk Micromachining of Silicon”, Aug. 1998, Proceedings of the IEEE, vol. 86, No. 8, pp. 1536-1551.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing anisotropic conductive sheet does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing anisotropic conductive sheet, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing anisotropic conductive sheet will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3990179

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.