Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-08-10
1996-06-11
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427578, 427579, 427569, 427131, B05D 306, G11B 726
Patent
active
055253792
ABSTRACT:
The present invention relates to a process for manufacturing an optical recording medium comprising a substrate and a laminate of a recording film and an inorganic dielectric film thereon, and the optical recording medium. The process comprises forming the inorganic dielectric film by using a helicon wave plasma CVD method.
REFERENCES:
patent: 4810935 (1989-03-01), Boswell et al.
patent: 4990229 (1991-02-01), Campbell et al.
patent: 5280154 (1994-01-01), Cuomo et al.
Patent Abstracts of Japan, vol. 12, No. 82 (C-481), Mar. 15, 1988 and JP-A-62 216 638.
Y. Sugiyama, et al., "Phase-Change Optical Disks with High Writing Sensitivity Using a SiN:H Protective Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition," Jap. J. of Appl. Phys., vol. 30, No. 8, Aug. 1991, pp. 1731-1737.
Adachi Toshio
Hongu Kazuoki
Koganei Akio
Miyakoshi Toshimori
Takada Kunio
Canon Kabushiki Kaisha
King Roy V.
LandOfFree
Method for manufacturing an optical recording medium does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing an optical recording medium, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing an optical recording medium will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-350491