Method for manufacturing an optical memory element

Details Method for manufacturing an optical memory element Method for manufacturing an optical memory element

1984-05-03

1985-10-01

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 1566591, 156663, 204192P, 204192EC, 427131, 427309, 430321, B44C 122, C03C 1500, C03C 2506

Patent

active

045444439

ABSTRACT:
An optical memory element includes stripe-shaped grooves formed directly on a glass substrate. To manufacture the optical memory element, a resist film is disposed on the glass substrate, and a groove pattern is formed in the resist film. A reactive ion etching is conducted through the groove pattern formed in the resist film so as to form the guide grooves in the glass substrate. After removing the resist film from the glass substrate, a magneto-optical recording layer is formed on the glass substrate.

REFERENCES:
patent: 3542453 (1970-11-01), Kantor
patent: 3571489 (1971-03-01), Coale
patent: 3585121 (1971-06-01), Franks et al.
patent: 4290075 (1981-09-01), Jacobs et al.
patent: 4405677 (1983-09-01), Chen
patent: 4431695 (1984-02-01), Flatscher
Sov. J. Opt. Technol., 45(3), Mar. 1978, Fabrication and Testing of Phase Masks for Information Storage and Processing Devices, V. Ya. Levin et al., pp. 171-174.

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